C - Chemistry – Metallurgy – 07 – D
Patent
C - Chemistry, Metallurgy
07
D
167/17.2, 260/46
C07D 317/28 (2006.01) A01N 47/20 (2006.01) A01N 47/24 (2006.01)
Patent
CA 1248539
- 1 - Abstract: The present invention relates to N-phenylcarbamates of the formula: Image wherein R1 is a C2-C4 alkyl group, a lower alkenyl group, a lower cyanoalkenyl group, a lower alkynyl group, a lower alkyl group substituted with at least one member selected from the group consisting of hydroxyl and cyano, or a group of the formula: Image -?NR4R5 in which R4 is a lower alkyl group, a lower alkenyl group, a lower alkynyl group or a lower haloalkyl group, R5 is a hydrogen atom or a lower alkyl group and n is 2, 3 or 4; R2 is a lower alkyl group, a lower alkenyl group, a lower alkynyl group or a lower alkyl group substituted with at least one member selected from the group consisting of halogen, lower alkoxy and lower cycloalkyl; R3 is a C1-C8 alkyl group, a C3-C8 alkenyl group, a C3-C8 alkynyl group, a lower cycloalkyl group, a lower haloalkenyl group, a lower - 1a - haloalkynyl group, a lower aralkyl group or a lower alkyl group substituted with at least one member selected from the group consisting of halogen, cyano, lower alkoxy, lower alkenyloxy, lower haloalkoxy, phenoxy, lower aralkyloxy and lower cycloalkyl; X and Y, which may be the same or different, represent an oxygen atom or a sulfur atom; and Z is a hydrogen atom, a lower alkyl group, a lower alkenyl group, a lower alkynyl group, a lower cycloalkyl group, a lower haloalkenyl group, a lower alkyl group substituted with at least one member selected from the group consisting of halogen, cyano, lower alkoxy and lower alkoxycarbonyl, or a group of the formula: -COR6 or -SO2R6 in which R6 is a lower alkyl group, a lower alkenyl group, a lower alkynyl group, a lower cycloalkyl group, a lower haloalkenyl group, a lower alkyl group substituted with at least one member selected from the group consisting of halogen, cyano, lower alkoxy, lower cyclo- alkyl and phenoxy (phenoxy being optionally substituted with at least one halogen and/or at least one alkyl), a phenyl group, a phenyl group substituted with at least one member selected from the group consisting of halogen, cyano, nitro, trifluoromethyl, lower alkyl and lower alkoxy, or an aralkyl group (aralkyl being optionally substituted with at least one halogen and/or at least one alkyl). These compounds ace useful as fungicidal agents against phytopathogenic fungi, particularly the strains thereof resistant to benzimidazole thiophanate fungicides and/or cyclic imide fungicide.
427328
Ishiguri Yukio
Kamoshita Katsuzo
Kato Toshiro
Noguchi Hiroshi
Takahashi Junya
Kirby Eades Gale Baker
Sumitomo Chemical Co. Ltd.
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