Gallium oxide coatings for optoelectronic devices

H - Electricity – 01 – L

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H01L 21/316 (2006.01) C23C 14/08 (2006.01) C30B 29/16 (2006.01) H01L 21/205 (2006.01) H01L 29/51 (2006.01) H01L 31/0216 (2006.01) H01L 33/00 (2006.01) H01S 5/028 (2006.01)

Patent

CA 2136580

An optoelectronic III-V or II-VI semiconductor device comprises a thin film coating with optical characteristics providing low midgap interface state density. A field effect device for inversion channel applications on III-V semiconductors also comprises a thin dielectric film providing required interface characteristics. The thin film is also applicable to passivation of states on exposed surfaces of electronic III-V devices. The thin film comprises a uniform, homogeneous, dense, stoichiometric gallium oxide (Ga2O3) dielectric thin film, fabricated by electron-beam evaporation of a single crystal, high purity Gd3 Ga5 O12 complex compound on semiconductor substrates kept at temperatures ranging from 40 to 370°C and at background pressures at or above 1x 10 - 10 Torr.

L'invention est un dispositif optoélectronique à semi-conducteur III-V ou II-VI comportant une couche mince servant d'interface à faible densité d'états au milieu de la bande interdite. L'invention porte également sur un dispositif à effet de champ pour applications à canal d'inversion dans les semi-conducteurs III-V qui comprend également une couche diélectrique mince ayant les caractéristiques d'interface requises. Cette couche mince est également utilisable dans les opérations de passivation sur les surfaces exposées de dispositifs électroniques à semi-conducteur III-V. Cette couche diélectrique uniforme, homogène et dense est faite d'oxyde de gallium stoechiométrique (Ga2O3) obtenue par évaporation au moyen d'un faisceau électronique d'un composé monocristalin complexe de grande pureté de Gd3Ga5O12 sur des substrats semi-conducteurs conservés à des températures allant de 40 à 370 oC sous des pressions de 1 x 10 -10 torr ou plus.

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