Gas seal for semiconductor processing equipment

Details Gas seal for semiconductor processing equipment Gas seal for semiconductor processing equipment

H - Electricity

01

L

356/187, 345/61

H01L 21/02 (2006.01) C30B 31/10 (2006.01)

Patent

CA 1198526

GAS SEAL FOR SEMICONDUCTOR PROCESSING EQUIPMENT Abstract of the Disclosure During production of laser diodes, crystals on which the laser diodes are formed are subjected to two high temperature processes: diffusion and alloying. These steps are performed in a quartz process tube in an oxygen free atmosphere. At some stage in the process the crystal must be moved from a cool zone to a hot zone within the tube and this is done by means of a push rod which extends through an aperture in the diffusion tube. The conventional arrangement for sealing around the push rod acts to clamp the push rod in position. Thus, temporarily, while the push rod is being moved the seal must be partly released and its sealing action is inferior. To maintain the process atmosphere free of reactive gas there is proposed by the invention a mechanism for flooding the sealing area between the push rod and the process tube with an inert gas while the sealing means is temporarily released. -?-

451107

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