Gas separation by combined pressure swing and displacement...

B - Operations – Transporting – 01 – D

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B01D 53/04 (2006.01) B01D 53/047 (2006.01) B01D 53/06 (2006.01)

Patent

CA 2477262

The present disclosure relates to systems and processes for adsorptive gas separations where a first gas mixture including components A and B is to be separated so that a first product of the separation is enriched in component A, while component B is mixed with a third gas component C contained in a displacement purge stream to form a second gas mixture including components B and C, and with provision to prevent cross contamination of component C into the first product containing component A, or of component A into the second gas mixture containing component C. The invention may be applied to hydrogen (component A) enrichment from syngas mixtures, where dilute carbon dioxide (component B) is to be rejected such as directly to the atmosphere, and with preferably nitrogen-enriched air as the displacement purge stream containing residual oxygen (component C).

Cette invention concerne des systèmes et des procédés de séparations de gaz par adsorption selon lesquels un premier mélange gazeux renfermant les composants A et B doit être séparé de sorte qu'un premier produit de la séparation soit enrichi en composant A et que le composant B soit mélangé à un troisième composant gazeux C contenu dans un courant de purge par déplacement afin qu'on obtienne un deuxième mélange gazeux renfermant les composants B et C. Dans ces procédés, il est important d'éviter toute contamination croisée du composant C dans le premier produit renfermant le composant A, ou du composant A dans le deuxième mélange gazeux renfermant le composant C. Cette invention peut être appliquée à l'enrichissement en hydrogène (composant A) à partir de mélanges de gaz de synthèse dans lesquels le dioxyde de carbone (composant B) dilué doit être rejeté, par exemple directement dans l'atmosphère, de l'air enrichi en azote constituant de préférence le courant de purge par déplacement contenant de l'oxygène résiduel (composant C).

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