Glancing angle deposition of thin films

Details Glancing angle deposition of thin films Glancing angle deposition of thin films

C - Chemistry, Metallurgy

03

C

C03C 17/245 (2006.01) C03C 17/00 (2006.01) C23C 14/22 (2006.01) C23C 14/50 (2006.01) G02B 1/10 (2006.01)

Patent

CA 2237732

A method of making vapor deposited thin films by rotating a substrate in the presence of an obliquely incident vapor flux. The substrate is rotated about an axis normal to the surface of the substrate while depositing a vapor flux, and then paused while depositing vapor flux to cause columns of a thin film to grow obliquely. The resulting thin film exhibits a porosity that is not dependent on the column angle of the resulting thin films.

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