Glass coating method and resulting article

C - Chemistry – Metallurgy – 03 – C

Patent

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117/86

C03C 17/02 (2006.01) C03C 17/245 (2006.01) C03C 17/34 (2006.01) C23C 16/02 (2006.01) C23C 16/40 (2006.01) C23C 16/44 (2006.01)

Patent

CA 1286550

ABSTRACT OF THE DISCLOSURE A continuous, chemical vapor deposition method for producing a coated glass article is disclosed. A glass substrate is advanced continuously, while hot, past first and second treating stations. A non-oxidizing atmosphere is maintained in the vicinity of the first treating station, while an oxidizing atmosphere is maintained in the vicinity of the second station. A non oxidizing gas which contains a silane, e.g., SiH4, is directed from the first treating station against a surface of the glass to form a silicon coating on that surface. An oxidizing gas which includes a metal compound in the vapor phase is directed from the second station against the silicon-coated surface of the article. The process is controlled so that the silane-containing gas forms a reflective silicon coating on the glass surface, the oxidizing gas which includes a metal compound forms a coating of an oxide of the metal, and oxidation before the article reaches the second treating station forms a silicon oxide layer on the silicon which is of sufficient thickness that the metal oxide layer is substantially free of pinholing.

519325

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