C - Chemistry – Metallurgy – 03 – C
Patent
C - Chemistry, Metallurgy
03
C
117/86
C03C 17/02 (2006.01) C03C 17/245 (2006.01) C03C 17/34 (2006.01) C23C 16/02 (2006.01) C23C 16/40 (2006.01) C23C 16/44 (2006.01)
Patent
CA 1286550
ABSTRACT OF THE DISCLOSURE A continuous, chemical vapor deposition method for producing a coated glass article is disclosed. A glass substrate is advanced continuously, while hot, past first and second treating stations. A non-oxidizing atmosphere is maintained in the vicinity of the first treating station, while an oxidizing atmosphere is maintained in the vicinity of the second station. A non oxidizing gas which contains a silane, e.g., SiH4, is directed from the first treating station against a surface of the glass to form a silicon coating on that surface. An oxidizing gas which includes a metal compound in the vapor phase is directed from the second station against the silicon-coated surface of the article. The process is controlled so that the silane-containing gas forms a reflective silicon coating on the glass surface, the oxidizing gas which includes a metal compound forms a coating of an oxide of the metal, and oxidation before the article reaches the second treating station forms a silicon oxide layer on the silicon which is of sufficient thickness that the metal oxide layer is substantially free of pinholing.
519325
Albach Eberhard R.
Callies Gerald A.
Conour John F.
Herrington Richard A.
G. Ronald Bell & Associates
Libbey-Owens-Ford Co.
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