Glass etching composition and method

Details Glass etching composition and method Glass etching composition and method

C - Chemistry, Metallurgy

03

C

C03C 15/00 (2006.01) H01L 21/311 (2006.01)

Patent

CA 2104087

ABSTRACT OF THE DISCLOSURE The present invention provides an improved glass etching composition which does not contain any causative materials such as hydrofluoric acid, causing environmental pollution. The etching composition comprises a first solution of a flow modifier and ammonium bifluoride in purified glycerine; and a second solution of ammonium bifluoride and ferric chloride in purified glycerine.

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