C - Chemistry – Metallurgy – 03 – C
Patent
C - Chemistry, Metallurgy
03
C
31/138, 261/17,
C03C 4/14 (2006.01) H01C 7/06 (2006.01) H01C 17/065 (2006.01)
Patent
CA 1194042
Abstract of the Disclosure This invention is concerned with the fabrication of thick film, RuO2-based resistors. More specifically, this invention is directed to the formulation of glass frits for use in such resistors exhibiting temperature coefficient of resistance values of less than 100 ppm. Such glass frits consist essentially, expressed in terms of mole percent on the oxide basis, of about 32-39% PbO, 44-47% B2O3, 14-17% SiO2, and an effective amount up to 5% of WO3 or MoO3.
420266
Corning Glass Works
Gowling Lafleur Henderson Llp
LandOfFree
Glass frits containing wo.sub.3 or moo.sub.3 in... does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Glass frits containing wo.sub.3 or moo.sub.3 in..., we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Glass frits containing wo.sub.3 or moo.sub.3 in... will most certainly appreciate the feedback.
Profile ID: LFCA-PAI-O-1226585