C - Chemistry – Metallurgy – 03 – C
Patent
C - Chemistry, Metallurgy
03
C
C03C 19/00 (2006.01) B41J 2/14 (2006.01) C03C 15/00 (2006.01) C03C 23/00 (2006.01) G02B 6/36 (2006.01) G02B 6/42 (2006.01)
Patent
CA 2418349
As a feature of a glass substrate having at least one fine hole according to the invention, a side wall surface of the fine hole is connected to each surface of the glass substrate by a curved surface as a boundary portion between the two. As another feature of the glass substrate, a layer denatured by machining is removed from the inner wall surface of the fine hole and the boundary portion between the wall surface and each surface of the glass substrate. The fine hole is produced by: forming a fine hole in a glass substrate by machining or laser machining; and then applying liquid-phase chemical etching to surfaces of the glass substrate and the fine hole. On this occasion, it is desirable that the etching liquid used for the liquid-phase chemical etching is either of an aqueous solution of hydrofluoric acid and an aqueous mixture solution of hydrofluoric acid and ammonium fluoride.
Hikichi Naoko
Kobayashi Fumitoshi
Shimmo Katsuhide
Nippon Sheet Glass Co. Ltd.
Riches Mckenzie & Herbert Llp
LandOfFree
Glass substrate with fine hole and method for producing the... does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Glass substrate with fine hole and method for producing the..., we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Glass substrate with fine hole and method for producing the... will most certainly appreciate the feedback.
Profile ID: LFCA-PAI-O-1933930