C - Chemistry – Metallurgy – 11 – D
Patent
C - Chemistry, Metallurgy
11
D
C11D 3/37 (2006.01) C11D 7/26 (2006.01) C11D 7/32 (2006.01) C11D 7/34 (2006.01) C11D 7/50 (2006.01) C11D 11/00 (2006.01) G03F 7/42 (2006.01) H01L 21/02 (2006.01)
Patent
CA 2741673
A microelectronic photoresist cleaning composition suitable for cleaning multi- metal microelectronic devices and to do so without any substantial or significant galvanic corrosion occurring when there is a subsequent rinsing step employing water.
L'invention porte sur une composition de nettoyage de photorésine microélectronique appropriée pour le nettoyage de dispositifs microélectroniques multimétalliques et pour réaliser ceci sans qu'aucune corrosion galvanique substantielle ou significative ne se produise lorsqu'il y a une étape de rinçage ultérieure employant de l'eau.
Avantor Performance Materials Inc.
Osler Hoskin & Harcourt Llp
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