C - Chemistry – Metallurgy – 08 – L
Patent
C - Chemistry, Metallurgy
08
L
C08L 71/02 (2006.01) C08K 3/00 (2006.01) C08K 3/10 (2006.01) C08K 5/00 (2006.01) C08K 5/06 (2006.01) C08K 5/103 (2006.01) C08K 13/02 (2006.01) C08L 27/06 (2006.01) C09K 3/16 (2006.01) C08L 27/06 (2006.01)
Patent
CA 2179954
A polyoxyalkylene compound and an inorganic salt are used to reduce the tendency of halogen-containing polymers to build up electrostatic charge and at the same time to achieve good stability.
Drewes Rolf
Hilti Bruno
Minder Ernst
Pfeiffer Jurgen
Ag Ciba-Geigy
Chemtura Vinyl Additives Gmbh
Fetherstonhaugh & Co.
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