Halogenated polysilane and plasma-chemical process for...

Details Halogenated polysilane and plasma-chemical process for... Halogenated polysilane and plasma-chemical process for...

B - Operations, Transporting

01

J

B01J 12/00 (2006.01) C01B 33/107 (2006.01) H05H 1/24 (2006.01)

Patent

CA 2726000

The invention relates to a halogenated polysilane (referred to in the following as polysilane) as a pure compound or as a mixture of compounds and to a plasma-chemical process for producing the same. The polysilane is particularly soluble and fusible and is characterized by significant product signals in special chemical shifts in 29Si NMR spectra. The process for producing the halogenated polysilane is characterized by using a low hydrogen portion and an especially low power density regarding the plasma discharge, thereby allowing the production of a halogenated polysilane which is particularly soluble.

L'invention concerne une polysilane halogéné (désigné ci-après par polysilane) sous forme de composé pur ou de mélange de composés, ainsi que son procédé chimique de production assisté par plasma. Ce polysilane présente une solubilité et une fusibilité particulièrement bonnes et se caractérise par des signaux de produit significatifs dans des plages de déplacement chimique particulières dans des spectres RMN 29Si. Ce procédé de production de polysilane halogéné est mis en oeuvre avec une faible quantité d'hydrogène et une densité d'énergie particulièrement faible en ce qui concerne la décharge plasma. On obtient ainsi un polysilane halogéné présentant une solubilité particulièrement bonne.

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