C - Chemistry – Metallurgy – 07 – D
Patent
C - Chemistry, Metallurgy
07
D
167/211, 260/273
C07D 401/12 (2006.01) A61K 31/395 (2006.01) C07D 213/82 (2006.01) C07D 215/54 (2006.01) C07D 471/04 (2006.01)
Patent
CA 1322752
- 1 - Abstract: Heteroarylcarboxamide derivatives of the formula (I): Image (I) wherein A is an alkylene group, X is?NCHPh2 or?C=CPh2 in which Ph is phenyl and Image is a group of the formula: Image or Image in which Y is a nitrogen atom or =CH-, R1 is hydroxy or mercapto, R2 is a hydrogen atom, a halogen atom, hydroxy, a lower alkyl group, a lower alkoxy group, nitro or cyano, R3 is a lower alkyl group, provided that R2 is attached at the 7-position when Y is a nitrogen atom, or physiologically acceptable salts thereof, a process for preparing the same and a pharmaceutical composition con- taining the same as an active ingredient. The compounds of the present invention and salts thereof show excellent antiallergic activity and thus are useful for the prophylaxis and treatment of allergic diseases.
573044
Ishii Katsumi
Kon Tatsuya
Nakamura Hideo
Nishikawa Yoshinori
Shindo Tokuhiko
Dainippon Pharmaceutical Co. Ltd.
Kirby Eades Gale Baker
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