C - Chemistry – Metallurgy – 03 – B
Patent
C - Chemistry, Metallurgy
03
B
C03B 8/02 (2006.01) C03B 19/12 (2006.01) C03B 37/016 (2006.01) C03C 1/00 (2006.01) C03C 3/06 (2006.01)
Patent
CA 2283569
There is provided a high-purity silica glass fabricating method using a sol- gel process. In the method, a first sol is formed by mixing 100 parts by weight of fumed silica powder with between 100 to 300 parts by weight of deionized water. The first sol is gelled, dried, powdered, and thermally treated. A second sol is formed by mixing the thermally-treated first sol with between 100 to 200 parts by weight of deionized water and 20 to 50 parts by weight of non-thermally treated original fumed silica powder. The second sol is gelled, dried, and sintered. Thus, a high-purity silica glass is formed.
L'invention concerne un procédé de fabrication de verre de silice à haute pureté par un processus sol-gel. Dans ledit procédé, on forme un premier sol en mélangeant 100 parties en poids de poudre de silice sublimée avec 100 à 300 parties en poids d'eau désionisée. On gélifie, on sèche, on met en poudre et on traite thermiquement le premier sol. on forme un deuxième sol en mélangeant le premier sol traité thermiquement avec environ 100 à 200 parties en poids d'eau désionisée et 20 à 50 parties en poids de poudre de silice sublimée primaire non traitée thermiquement. On gélifie, on sèche et on fritte le deuxième sol. On forme ainsi un verre de silice à haute pureté.
Baik Young Min
Jun Myung Chul
Kim Sun Uk
Yoon Young Sik
Samsung Electronics Co. Ltd.
Smart & Biggar
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