C - Chemistry – Metallurgy – 01 – B
Patent
C - Chemistry, Metallurgy
01
B
C01B 33/141 (2006.01) C01B 33/14 (2006.01) C03B 19/06 (2006.01) C04B 35/14 (2006.01) C04B 35/626 (2006.01)
Patent
CA 2384288
The invention relates to highly filled SiO2 dispersions, to methods for the production thereof and to methods used for producing porous, amorphous SiO2 shaped bodies having extremely high filling degrees. The inventive dispersion concerns a homogeneous and easily pourable dispersion of amorphous SiO2 particles in a dispersing agent. Said dispersion is characterized in that it has a filling degree of at least 80 wt. % of amorphous SiO2 particles, and the amorphous SiO2 particles have a bimodal grain size distribution.
L'invention concerne des dispersions de SiO¿2? à haut coefficient de charge, des procédés permettant de les préparer et des procédés permettant de produire des corps moulés en SiO¿2? poreux amorphes à coefficients de charge extrêmement élevés. Dans le cas de la dispersion selon l'invention, il s'agit d'une dispersion homogène très coulante de particules de SiO¿2? amorphes dans un agent dispersant, qui se caractérise en ce qu'elle présente un coefficient de charge d'au moins 80 % en poids de particules de SiO¿2? et en ce que les particules de SiO¿2? amorphes ont une répartition granulométrique bimodale.
Frey Volker
Molter Achim
Ritter Peter
Scherm Hans-Peter
Schweren Wolfgang
Bereskin & Parr Llp/s.e.n.c.r.l.,s.r.l.
Wacker-Chemie Gmbh
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