C - Chemistry – Metallurgy – 08 – F
Patent
C - Chemistry, Metallurgy
08
F
C08F 220/04 (2006.01) B41N 1/12 (2006.01) B41N 3/03 (2006.01) B41N 3/08 (2006.01) C08F 220/10 (2006.01) C08F 220/34 (2006.01) G03F 7/028 (2006.01) G03G 13/28 (2006.01)
Patent
CA 2047463
Abstract of the Disclosure The invention relates to a hydrophilic copolymer having the general structure: ...-(A)m-...-(B)n-...-(C)o-...-(D)p-... in which A is at least one polymerizable monomer having an acidic side group, B is at least one polymerizable monomer having a basic side group, C is at least one polymerizable monomer having a non-polar, non- hydrophilic side group, and D is at least one polymerizable monomer capable of increasing the hydrophilic character of monomer A or to form a chelate with monomer A, m, n, o and p are the monomer contents of monomers A, B, C and D, respectively, in mol%, with m + n + o + p = 100 mol%, with the proviso that m and n are each ? 2 mol% and p is ? 1 mol%, wherein the copolymer is a linear copolymer having a random structure of the monomers. The copolymer is useful as a hydrophilizing agent for lithographic and offset printing plates, and as a binder in light-sensitive lithographic layers.
Faust Raimund J.
Lutz Silvia
Pliefke Engelbert
Faust Raimund J.
Fetherstonhaugh & Co.
Hoechst Aktiengesellschaft
Lutz Silvia
Pliefke Engelbert
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