C - Chemistry – Metallurgy – 07 – C
Patent
C - Chemistry, Metallurgy
07
C
167/179, 260/312
C07C 311/20 (2006.01) C07C 233/52 (2006.01) C07C 311/29 (2006.01) C07D 257/06 (2006.01) C07D 333/34 (2006.01) C07D 333/36 (2006.01)
Patent
CA 1331462
- 1 - Abstract: Indan derivatives of the formula: (I) Image wherein R1 is substituted or unsubstituted phenyl, naphthyl or sulfur-containing heterocyclic group, and R2 is hydroxy- methyl or a group of the formula: Image wherein R3 is a hydrogen atom or lower alkyl and R4 is cycloalkyl, lower alkoxycarbonyl-phenyl, carboxy-phenyl, nitrogen-containing heterocyclic group, lower alkyl, or lower alkyl having a substituent selected from lower alkoxycarbonyl, carboxy, lower alkoxycarbonyl-phenyl, carboxy-phenyl, lower alkoxy- carbonyl-cycloalkyl and carboxy-cycloalkyl, or a pharma- ceutically acceptable salt thereof, which are useful as platelet aggregation-inhibiting agents and as agents for the treatment, amelioration and/or prophylaxis of a variety of thrombosis or embolism, coronary and cerebral vascular smooth muscle vellication, asthma, and the like, processes for the preparation thereof, and a pharmaceutical composition containing said compound as an active ingredient.
583351
Ikezawa Katsuo
Iwakuma Takeo
Kohno Harumichi
Odawara Akio
Sasaki Yasuhiko
Ikezawa Katsuo
Iwakuma Takeo
Kirby Eades Gale Baker
Kohno Harumichi
Odawara Akio
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