Inductively coupled plasma alignment apparatus and method

H - Electricity – 05 – H

Patent

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

H05H 1/02 (2006.01) H05H 1/30 (2006.01)

Patent

CA 2548688

An inductively coupled plasma alignment apparatus comprising: a coil 10 for generating an inductively coupled plasma in a gas, the coil having a first axis 100; a torch 20 passing at least partially through the coil, the torch having a second axis 200; and an adjustment mechanism 80, 110 for adjusting the position of the torch with respect to the coil so as to alter the relative configuration of the first and second axes. The adjustment mechanism may adjust an angle and/or a distance between the second axis and the first axis. The second axis may be held substantially parallel to the first axis, while the adjustment mechanism adjusts a distance between the second axis and the first axis. The coil is preferably maintained substantially fixed in position with respect to a sampling aperture for sampling photons or ions from the plasma.

LandOfFree

Say what you really think

Search LandOfFree.com for Canadian inventors and patents. Rate them and share your experience with other people.

Rating

Inductively coupled plasma alignment apparatus and method does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Inductively coupled plasma alignment apparatus and method, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Inductively coupled plasma alignment apparatus and method will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFCA-PAI-O-2090749

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.