Ingaas field effect transistor

H - Electricity – 01 – L

Patent

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356/149

H01L 29/78 (2006.01) H01L 29/201 (2006.01) H01L 29/51 (2006.01)

Patent

CA 1196111

- 12 - InGaAs FIELD EFFECT TRANSISTOR Abstract InGaAs FETs using a silicon nitride layer, between the metal and the channel layer reduce the gate leakage current and yield desirable FET characteristics, particularly high transconductance.

421665

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