Integrated circuit photomask

Details Integrated circuit photomask Integrated circuit photomask

G - Physics

03

F

356/12

G03F 7/26 (2006.01) G03F 1/14 (2006.01)

Patent

CA 1187203

Integrated Circuit Photomask Abstract A photomask formed of a transparent dielectric substrate, such as glass and quartz based sub- strates, having a conductive surface adjacent region, which is patterned with sequential over- coatings of a composite chrome oxide layer and a chrome film. The mask comprises a combination of varied reflectivities to provide proper densities for the opaque areas of the mask.

417821

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