Ion chamber with a flat sensitivity response characteristic

Details Ion chamber with a flat sensitivity response characteristic Ion chamber with a flat sensitivity response characteristic

H - Electricity

01

J

358/25

H01J 47/02 (2006.01)

Patent

CA 1214287

ABSTRACT OF THE DISCLOSURE An ion chamber exhibiting a flat response to a wide range of incident gamma energy is provided by a high-pressure fill gas mixture of a first major constitu- ent, low atomic number gas which exhibits a reduced gamma response at low gamma energy levels, and a second minor constituent, high atomic number gas which exhibits an increased gamma response at low gamma energy levels. The preferred fill gas mixture is nitrogen as the major con- stituent and xenon as the minor constituent.

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