Line generator optical apparatus

G - Physics – 02 – B

Patent

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Details

G02B 27/00 (2006.01) G02B 13/08 (2006.01) G01B 11/25 (2006.01) G02B 27/44 (2006.01)

Patent

CA 2390781

An apparatus for generating linear patterns of light comprises a light source emitting a first light beam. An anamorphic system is positioned downstream of the light source and is adapted to receive the first light beam of the light source for concentrating the first light beam such that the first light beam would project a first linear pattern on a far field. A diffractive optical element is positioned downstream of the anamorphic system for receiving and diffusing the first light beam of the anamorphic system a plurality of second light beams. The plurality of second light beams overlap one another at least partially so as to project a second linear pattern on the far field of altered intensity with respect to the first linear pattern.

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