Liner for semiconductor etching chamber

Details Liner for semiconductor etching chamber Liner for semiconductor etching chamber

H - Electricity

01

J

H01J 37/32 (2006.01)

Patent

CA 2393283

A liner is provided for protecting the inside chamber and dome used in semiconductor fabrication. This liner is capable of protecting the dome and chamber against corrosion caused by plasma field generation and byproducts of dry etching processes. In addition, the liner described in this invention has a long life under conditions induced by plasma field generation.

L'invention concerne une doublure pour la protection de la chambre intérieure et du dôme utilisés dans la fabrication de semi-conducteur. Ladite doublure protège le dôme et la chambre de la corrosion induite par la génération de champ de plasma et par les sous-produits des procédés de gravure à sec. Par ailleurs, la doublure de l'invention possède une longue durée de vie dans des conditions induites par la génération de champ de plasma.

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