Lithographic image size reduction photomask

Details Lithographic image size reduction photomask Lithographic image size reduction photomask

H - Electricity

01

L

356/192, 101/48

H01L 21/306 (2006.01) H01L 21/033 (2006.01) H01L 21/308 (2006.01)

Patent

CA 1260627

Disclosed is a process for reducing lithographic image size for integrated circuit manufacture. A mask of photosensitive material having an opening of a minimum size dictated by the limits of lithography is formed on a substrate. Reduction in the image size is achieved by establishing sidewalls to the interior vertical surfaces of the opening by depositing a conformal layer, followed by anisotropic etching. The dimension of the opening is reduced by the combined thickness of the two opposite insulator sidewalls. In a specific direct application of the disclosed process, a photomask/stencil having a pattern of openings of a minimum size smaller than possible by lithography, per se, is formed.

580378

Affiliated with

Also associated with

Rating

Lithographic image size reduction photomask does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Lithographic image size reduction photomask, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Lithographic image size reduction photomask will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFCA-PAI-O-1265907