Low temperature reduction process for large photomasks

Details Low temperature reduction process for large photomasks Low temperature reduction process for large photomasks

C - Chemistry, Metallurgy

03

C

8/5, 95/94.5

C03C 21/00 (2006.01) C03C 23/00 (2006.01) G03F 1/08 (2006.01) G03F 5/00 (2006.01)

Patent

CA 1190355

Abstract of the Disclosure Glass photomasks having a high resolution stain pattern for use in photolithographic processes are made by migrating stain-producing cations into a surface of the glass, and heating the glass containing the stain- producing rations in a pressure vessel containing an inert liquid saturated with hydrogen under pressure at relatively low temperatures to reduce and agglomerate the stain-producing cations to form a high resolution stain pattern.

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