Low temperature reduction process for photomasks

Details Low temperature reduction process for photomasks Low temperature reduction process for photomasks

C - Chemistry, Metallurgy

03

C

8/5, 95/94.5

C03C 21/00 (2006.01) C03C 23/00 (2006.01) G03F 1/08 (2006.01) G03F 5/00 (2006.01)

Patent

CA 1190354

Abstract of the Disclosure Glass photomasks having a high resolution stain pattern for use in photofabrication processes are made by migrating stain-producing ions into the surface of a glass substrate, and reducing and agglomerating the stain-producing ions in the presence of pure hydrogen under pressure at relatively low temperatures to produce a high resolution stain pattern.

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