Machine reticle inspection device

Details Machine reticle inspection device Machine reticle inspection device

G - Physics

03

B

88/13, 88/67

G03B 27/42 (2006.01) G03F 7/20 (2006.01)

Patent

CA 1191040

ABSTRACT OF THE DISCLOSURE A device is disclosed for use on a projection type semicon- ductive wafer precision step-and-repeat alignment and exposure system for on-machine inspection of a reticle containing the circuitry to be printed on the wafer. Two apertured optical detectors are aligned with identical portions of the projected image of the reticle and scanned across the image of the reticle. Any difference in the electrical response of the two optical de- tectors indicates dirt or a flaw in the reticle.

403039

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