Magnetic apparatus for reducing substrate warpage

Details Magnetic apparatus for reducing substrate warpage Magnetic apparatus for reducing substrate warpage

H - Electricity

01

L

345/23

H01L 31/06 (2006.01) C23C 16/54 (2006.01) H01J 37/34 (2006.01) H01L 21/677 (2006.01)

Patent

CA 1189174

ABSTRACT An apparatus for producing improved large area photovoltaic devices by substantially reduc- ing the warpage of relatively large area, rela- tively thin webs of magnetic substrate material which travel through a plurality of high tempera- ture, low pressure glow discharge deposition cham- bers. As the web of the substrate material moves through the deposition chambers, it assumes A normal, elongated path of travel. Due to the elevated deposition temperature; the elongated path of travel, the force of gravity, etc., the web has a tendency to warp. Warpage of the web is undesirable as it promotes the deposition of non- uniform semiconductor alloy layers. The improve- ment of the present invention contemplates the establishment of at least one magnetic field with- in each deposition chamber which is adapted to urge the web of substrate material out of its normal path of travel into a flat, substantially planar path of travel. The new flat path of trav- el serves to substantially reduce warpage of the web which permits uniform amorphous semiconductor alloy layers to be deposited. In alternate em- bodiments, the web of substrate material may be urged into sliding contact with a plurality of stationary ceramic magnets or the web may be urged into rolling contact with a plurality of rotatable magnetic elements which may either be hollow, ceramic magnets or electromagnets.

432237

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