Magnetically enhanced plasma process and apparatus

Details Magnetically enhanced plasma process and apparatus Magnetically enhanced plasma process and apparatus

H - Electricity

01

L

204/96.05, 204/1

H01L 21/306 (2006.01) C23F 4/00 (2006.01) H01J 37/32 (2006.01) H01J 37/34 (2006.01)

Patent

CA 1196599

ABSTRACT The efficiency of plasma etching can be increased several-fold by providing a confining magnetic field (45) close to a substrate support electrode (24). The electrode has a prismatic body (31) with at least two flat faces. Magnetic pole pieces (41, 43) of opposite polarity project beyond the faces at opposite ends of the body and extend completely around the body. The pole pieces create a magnetic field that extends parallel to the flat faces and surrounds the body like a belt.

420148

Affiliated with

Also associated with

Rating

Magnetically enhanced plasma process and apparatus does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Magnetically enhanced plasma process and apparatus, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Magnetically enhanced plasma process and apparatus will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFCA-PAI-O-1169282