4. H - Electricity
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Steven D. Hurwitt

H - Electricity – 01 – L

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Country: United States Of America

Cathode and target design for a sputter coating apparatus

C - Chemistry – Metallurgy – 23 – C
Patent

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Extended lifetime collimator

C - Chemistry – Metallurgy – 23 – C
Patent

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Focusing magnetron sputtering apparatus

C - Chemistry – Metallurgy – 23 – C
Patent

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Focusing magnetron sputtering apparatus

C - Chemistry – Metallurgy – 23 – C
Patent

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Magnetically enhanced plasma process and apparatus

H - Electricity – 01 – L
Patent

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Profile ID: LFCA-PAI-P-1074380

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