Maleimide containing, negative working deep uv photoresist

Details Maleimide containing, negative working deep uv photoresist Maleimide containing, negative working deep uv photoresist

C - Chemistry, Metallurgy

08

F

96/158, 402/480,

C08F 212/08 (2006.01) C08F 216/14 (2006.01) G03F 7/022 (2006.01) G03F 7/038 (2006.01) G03F 7/039 (2006.01) G03F 7/075 (2006.01)

Patent

CA 2020378

Abstract A method for producing a negative image by coating a substrate with a photosensitive layer containing a self-crosslinkable maleimide copolymer capable of crosslinking in the presence of a photogenerated acid and heat. The composition is coated and dried on a substrate, then imagewise exposed, baked and developed with an aqueous alkaline solution.

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