Method and apparatus for coating a glass substrate

C - Chemistry – Metallurgy – 03 – C

Patent

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Details

C03C 17/22 (2006.01) C03C 17/00 (2006.01) C03C 17/245 (2006.01) C23C 16/453 (2006.01) C23C 16/455 (2006.01) C23C 16/44 (2006.01)

Patent

CA 2136639

2136639 9424331 PCTABS00034 An apparatus (10) for applying a coating to a substrate comprising a gas distributor (14) having an outlet (30) disposed adjacent to the substrate for directing a gaseous reactant mixture to the surface of the substrate. A plurality of drop tubes (24) are provided which communicate with and are spaced along the length of the distributor for supplying the gaseous reactant mixture to the distributor. The apparatus includes means for determining the uniformity of the thickness of the coating (38) which is applied to the substrate along its width. Finally, there is a means for supplying one or more of the reactants or an inert gas (36) to one or more of the drop tubes to alter the concentration of one or more of the reactants in the gaseous reactant mixture flowing through one of more drop tubes. The rate of deposition of the coating in the proximity of such drop tubes is thereby altered to improve the uniformity of the coating deposited.

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