Method and apparatus for reacting thin films on...

Details Method and apparatus for reacting thin films on... Method and apparatus for reacting thin films on...

H - Electricity

05

K

H05K 3/22 (2006.01) H05K 1/09 (2006.01) H05K 3/12 (2006.01)

Patent

CA 2740786

A method for reacting thin films on a low-temperature substrate within a reactive atmosphere is disclosed. The thin film contains a reducible metal oxide, and the reactive atmosphere contains a reducing gas such as hydrogen or methane. The low temperature substrate can be polymer, plastic or paper. Multiple light pulses from a high intensity strobe system are used to reduce the metal oxide to metal and to sinter the metal if applicable.

L'invention concerne un procédé pour faire réagir des films minces sur un substrat basse température dans une atmosphère de réaction. Le film mince contient de l'oxyde métallique pouvant être réduit, et l'atmosphère réactive contient un gaz réducteur tel que de l'hydrogène ou du méthane. Le substrat basse température peut être un polymère, une matière plastique ou du papier. De multiples impulsions lumineuses provenant d'un système de stroboscope à intensité élevée sont utilisées pour réduire l'oxyde métallique en métal et pour fritter le métal si ceci est applicable.

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