Method and composition for removing sodium-containing...

Details Method and composition for removing sodium-containing... Method and composition for removing sodium-containing...

G - Physics

03

F

G03F 7/42 (2006.01) C23G 1/06 (2006.01)

Patent

CA 2403730

A method and composition for removing sodium-containing materials such as photoresist from microcircuit substrate material utilizes 1,2-Diaminocyclohexanetetracarboxylic Acid in an organic solvent.

L'invention concerne un procédé et une composition permettant de retirer un matériau contenant du sodium, tel qu'un photorésist, d'un matériau de substrat de microcircuit qui utilise un acide 1, 2-diaminocyclohéxanetétracarboxylique dans un solvant organique.

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