Method for coating glass substrates

Details Method for coating glass substrates Method for coating glass substrates

C - Chemistry, Metallurgy

03

C

C03C 17/245 (2006.01) B05D 5/06 (2006.01) B32B 17/06 (2006.01) C03C 17/34 (2006.01) C23C 16/40 (2006.01)

Patent

CA 2104592

2104592 9312892 PCTABS00024 A method for coating glass by chemical-vapor deposition below 200 ·C, at atmospheric pressure of a gaseous mixture of a tin oxide precursor, a silicon dioxide precursor and an accelerant such as triethyl phosphite provides deposition rates greater than 350 Å per second. The layer of material deposited can be combined with other layers to produce an article with specific properties such as controlled emissivity, refractive index, abrasion resistance, and appearance.

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