Method for depositing a thin film, and resulting material

C - Chemistry – Metallurgy – 03 – C

Patent

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Details

C03C 17/23 (2006.01) B23K 26/00 (2006.01) C03C 17/245 (2006.01) C03C 17/34 (2006.01) C23C 14/58 (2006.01) H01L 31/0216 (2006.01) H01L 31/0224 (2006.01)

Patent

CA 2762312

The invention relates to a method for producing a substrate coated on a first surface with at least one transparent and electrically conductive thin film containing at least one oxide, including the following steps: depositing said at least one thin film on said substrate; subjecting said at least one thin film to a heat treatment step in which said at least one film is irradiated with a radiation having a wavelength of between 500 and 2000 nm and focused on an area of said at least one film, at least one dimension of which does not exceed 10 cm, said radiation being emitted by at least one radiation device located opposite said at least one film, and a relative movement being generated between said radiation device and said substrate so as to treat the desired surface, said heat treatment being such that the resistivity of said at least one film is reduced during the treatment.

L'invention a pour objet un procédé d'obtention d'un substrat revêtu sur une première face d'au moins une couche mince transparente et électro-conductrice à base d'au moins un oxyde, comprenant les étapes suivantes : on dépose ladite au moins une couche mince sur ledit substrat; on soumet ladite au moins une couche mince à une étape de traitement thermique dans laquelle on irradie ladite au moins une couche à l'aide d'un rayonnement possédant une longueur d'onde comprise entre 500 et 2000 nm et focalisé sur une zone de ladite au moins une couche dont une dimension au moins n'excède pas 10 cm, ledit rayonnement étant issu d'au moins un dispositif de rayonnement placé en regard de ladite au moins une couche, un déplacement relatif étant créé entre ledit dispositif de rayonnement et ledit substrat de manière à traiter la surface souhaitée, ledit traitement thermique étant tel que la résistivité de ladite au moins une couche est diminuée lors du traitement.

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