G - Physics – 03 – F
Patent
G - Physics
03
F
G03F 7/038 (2006.01) B24C 1/04 (2006.01) G03F 7/008 (2006.01) G03F 7/033 (2006.01) G03F 7/12 (2006.01) G03F 7/30 (2006.01) G03F 7/34 (2006.01)
Patent
CA 2041521
A method for engraving and/or etching comprising the steps of: (a) a process for exposing, to light, a layer of a water-soluble resin composition of a laminated photo-sensitive film which comprises a supporting sheet, a image mask-protection layer peelablly adhered to the supporting sheet and a layer of a water-soluble resin composition having photocrosslinkability to thus cause crosslinking of the exposed area of the resin layer to thereby form a predetermined pattern on the resin layer; (b) a process for dissolving out the non-crosslinked portion of the layer of the water-soluble photo-sensitive resin composition by developing the layer with water to thus from an image-carrying mask which is constituted from the crosslinked area of the photo-sensitive resin composition remaining on the image mask-protection layer; (c) a process for adhering the photo-sensitive laminate film on which the images are formed to the surface of a material to be processed; (d) a process for peeling off the supporting sheet from the photo-sensitive laminate film; and (e) a process for engraving and/or etching the material to be processed through the image-carrying mask adhered to the material, makes it possible to engrave and/or etch fine and precises images on the surface of a material to be processed such as glass, metals, plastics or the like.
Cette invention concerne une méthode de gravure comprenant les étapes suivantes : (a) insolation d'une couche de résine hydrosoluble d'une pellicule stratifiée photosensible composée d'une feuille support, d'une couche de protection de masque pelable collé à la feuille support et d'une couche de résine hydrosoluble photoréticulable, l'insolation visant la réticulation de la partie exposée de la couche de résine et la formation d'un motif prédéterminé sur cette couche; (b) dissolution de la partie non réticulée de la couche de résine hydrosoluble photosensible en développant ladite couche à l'eau pour former un masque constitué des zones réticulées de la résine photosensible qui subsistent sur la couche de protection du masque; (c) collage de la pellicule stratifiée photosensible portant les images à la surface d'un matériau à traiter; (d) séparation de la pellicule stratifiée photosensible de la feuille support par pelage; et (e) gravure du matériau à traiter à travers le masque y collé. Cette méthode permet d'obtenir des images de grande précision à la surface du matériau à traiter : verre, métal, plastique ou matériau analogue.
Suzuki Ikuo
Suzuki Tsutomu
Aicello Chemical Co. Ltd.
Ogilvy Renault Llp/s.e.n.c.r.l.,s.r.l.
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