Method for fabricating an optical waveguide

Details Method for fabricating an optical waveguide Method for fabricating an optical waveguide

H - Electricity

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H01L 21/64 (2006.01) B05D 1/08 (2006.01) C03B 19/14 (2006.01) C03C 17/02 (2006.01) G02B 6/12 (2006.01) G02B 6/13 (2006.01)

Patent

CA 2084461

ABSTRACT OF THE DISCLOSURE In the first step, a fuel and raw material gasses are fed to a burner while flames from the burner scan a Si substrate. Synthesized glass fine particles are deposited on the substrate to form a first porous vitreous layer to be a under cladding layer. In the second step, the first porous vitreous layer is heated by the flames. A bulk density of an upper part of the first porous vitreous layer is raised to 0.3 g/cm3. This upper part with a raised bulk density functions as a shield layer against GeO2. In the third step, a second porous vitreous layer to be a core layer is deposited uniformly on the first porous vitreous layer. In the fourth step, the first and the second porous vitreous layers are sintered. In this case, the shield layer with a higher bulk density hinders the GeO2 component which has evaporated from the second porous vitreous layer from diffusing into the first porous vitreous layer.

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