Method for fabricating group iii nitride devices and devices...

H - Electricity – 01 – L

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H01L 33/00 (2010.01) H01L 33/32 (2010.01) H01L 33/46 (2010.01)

Patent

CA 2564995

A method according to the present invention for fabricating high light extraction photonic device comprising growing an epitaxial semiconductor structure on a substrate and depositing a first mirror layer on the epitaxial semiconductor structure such that the epitaxial semiconductor structure is sandwiched between the first mirror layer and the substrate. Flip-chip mounting the epitaxial semiconductor structure, with its first mirror and substrate on a submount such that the epitaxial semiconductor device structure is sandwiched between the submount and substrate. The substrate is then removed from the epitaxial structure by introducing an etch environment to the substrate. A second mirror layer is deposited on the epitaxial semiconductor structure such that the epitaxial semiconductor structure is sandwiched between the first and second mirror layers. A device according to the present invention comprising a resonant cavity light emitting diode (RCLED) mounted to a submount.

Cette invention concerne un procédé permettant de fabriquer des dispositifs photoniques à forte extraction de lumière consistant à former une structure semi-conductrice épitaxiale sur un substrat et à déposer une première couche miroir sur la structure semi-conductrice épitaxiale de façon que cette structure semi-conductrice épitaxiale soit intercalée contre la première couche miroir et le substrat, à effectuer un montage de puces à protubérances de la structure semi-conductrice épitaxiale, son premier miroir et son substrat étant montés sur une embase de façon que la structure semi-conductrice épitaxiale du dispositif soit intercalée entre l'embase et le substrat. Le substrat est ensuite retiré de la structure épitaxiale par l'introduction d'un environnement de gravure sur le substrat. Une seconde couche miroir est déposée sur la structure semi-conductrice épitaxiale de façon que la structure semi-conductrice épitaxiale soit intercalée entre la première et la seconde couche miroir. Le dispositif de la présente invention comprend une diode électroluminescente à cavité résonnante (RCLED) montée sur une embase.

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