Method for forming a photoresist with a cover coat

Details Method for forming a photoresist with a cover coat Method for forming a photoresist with a cover coat

G - Physics

03

F

356/1, 96/172

G03F 7/038 (2006.01) G03F 7/022 (2006.01) G03F 7/09 (2006.01) G03F 7/16 (2006.01) H05K 1/03 (2006.01) H05K 3/00 (2006.01)

Patent

CA 2031395

Abstract of the Disclosure An improved method for forming a photoresist with a cover coat comprising forming a photosensitive resinous layer on a conductive board by an anionic electrodeposition coating means, washing with water, dipping the coated board into a water dispersion comprising 100 to 30% by weight (in solid) of an acrylic polymer of perfluoro alkyl acrylate or methacrylate and other .alpha.,.beta. -ethylenically unsaturated monomer and 0 to 70% by weight (in solid) of a water soluble high molecular weight compound, pH of which is controlled in 7.0 to 9.0, and finally drying. In this method, only one drying operation is required at the final stage.

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