Method for optimizing process parameters in photoactive...

Details Method for optimizing process parameters in photoactive... Method for optimizing process parameters in photoactive...

H - Electricity

01

L

345/26, 345/61

H01L 21/66 (2006.01) H01L 31/20 (2006.01)

Patent

CA 1264366

METHOD FOR OPTIMIZING PROCESS PARAMETERS IN PHOTOACTIVE SEMICONDUCTOR MANUFACTURING IN SITU ABSTRACT Materials and systems substantially having photoactive properties are produced with a high quality output and without time losses in the fabrication process. To determine the quality of the photoactive material in situ, conductivity is induced in the material by exciting charge carriers through irradiation, and an electromagnetic field influenced thereby is measured, with the result of the measurement being evaluated by a computer with a corresponding control of actuating members such as valves and controllers. Optimum process parameters are thus found and used for the process.

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