C - Chemistry – Metallurgy – 03 – B
Patent
C - Chemistry, Metallurgy
03
B
C03B 17/02 (2006.01) B05C 9/14 (2006.01) B05D 3/04 (2006.01) C03B 19/14 (2006.01) C03C 17/00 (2006.01) C03C 17/02 (2006.01) C23C 14/10 (2006.01) C23C 16/44 (2006.01) C23C 16/453 (2006.01) G02B 6/00 (2006.01)
Patent
CA 2091711
A method of producing an oxide glass thin film includes a process to obtain a transparent glass film, in which volatilization of additives in a porous film deposited is effectively suppressed and which can provide an oxide glass thin film having a desired arrangement of refractive index with a low optical loss. The method is for producing an oxide glass thin film, in which glass fine particles mainly containing SiO2 with additives are deposited on a substrate to form a porous thin film and then heated to form a transparent glass film. In the method, vapor of oxides of additive components is mixed in an atmosphere in which the porous thin film is heated to form the transparent glass film, whereby stopping the volatilization of the additives in the porous film deposited, preventing diffusion of the additives added to a core layer, and preventing the volatilization of glass transition temperature lowering components of additives (P2O5, B2O3. GeO2, etc.). By these, a desired arrangement of refractive index may be obtained, and an oxide glass thin film may be obtained while lowering the optical loss such as the optical scattering, which could be caused by bubbles in an unsintered portion.
Aikawa Haruhiko
Hirose Chizai
Ishikawa Shinji
Kanamori Hiroo
Saitoh Masahide
Marks & Clerk
Sumitomo Electric Industries Ltd.
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