Method for the production of bubble-free objects of quartz...

Details Method for the production of bubble-free objects of quartz... Method for the production of bubble-free objects of quartz...

C - Chemistry, Metallurgy

03

C

49/78.1

C03C 3/06 (2006.01) C03B 32/00 (2006.01)

Patent

CA 1071410

ABSTRACT OF THE DISCLOSURE A method for producing quartz glass objects starting from a melt of silicon dioxide in helium-hydrogen atmosphere. The drawn objects, after cooling, are first heated in the temperature range of 800-1400°C and thereafter at a temperature of at least 1600°C. The result is a considerable reduction in the number of bubbles if the last-mentioned heating step is continued for a sufficient time.

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