Method of etching a pattern in glass

Details Method of etching a pattern in glass Method of etching a pattern in glass

C - Chemistry, Metallurgy

03

C

149/10, 96/207

C03C 15/00 (2006.01) B44C 1/22 (2006.01)

Patent

CA 1061159

ABSTRACT: In order to coat glass with a satisfactorily adhering photosensitive etching resist for the purpose of etching patterns in the glass, first an uniform TiO2 layer is deposited by bringing the glass surface into contact with a pyrolysable titanium compound at a tem- perature between 180 °C and 240 °C.

235541

Affiliated with

Also associated with

Rating

Method of etching a pattern in glass does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Method of etching a pattern in glass, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Method of etching a pattern in glass will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFCA-PAI-O-954790