Method of fabrication of a microfluidic device

Details Method of fabrication of a microfluidic device Method of fabrication of a microfluidic device

C - Chemistry, Metallurgy

03

C

C03C 27/02 (2006.01) B01L 3/00 (2006.01) B32B 15/08 (2006.01) B81B 1/00 (2006.01) B81C 1/00 (2006.01) C09K 13/00 (2006.01) C23C 16/06 (2006.01) C23F 1/00 (2006.01) G01N 33/487 (2006.01)

Patent

CA 2428980

The present invention relates to a method of fabricating a microfluidic device including at least two substrates provided with a fluid channel, comprising tho steps of: a) etching at least a channel and one or more fluid ports in a first and/or a second substrate; b) depositing a first layer on a surface of the second substrate; c) partially removing the first layer in accordance with a predefined geometry; d) depositing a second layer on top of the first layer and the substrate surface; e) planarizing the second layer so as to smooth the upper surface thereof; f) aligning the first end second substrate; g) bonding the first substrate on the planarized second layer of the second substrate.

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