Method of making fused silica

Details Method of making fused silica Method of making fused silica

C - Chemistry, Metallurgy

03

C

C03C 17/30 (2006.01) C03B 19/14 (2006.01) C03B 37/014 (2006.01) C03C 3/06 (2006.01) C03C 13/04 (2006.01) C03C 17/245 (2006.01) C09D 1/00 (2006.01) G02B 6/10 (2006.01)

Patent

CA 2062882

Abstract of the Disclosure This invention relates to the production of high purity fused silica glass through oxidation and/or flame hydrolysis of a halide-free, organosilicon-R compound in vapor form having the following properties: (a) producing a gas stream of a halide-free silicon- containing compound in vapor form capable of being con- verted through thermal decomposition with oxidation or flame hydrolysis to SiO2; (b) passing said gas stream into the flame of a combustion burner to form amorphous particles of fused SiO2; (c) depositing said amorphous particles onto a support; and (d) either essentially simultaneously with said deposition or subsequently thereto consolidating said deposit of amorphous particles into a virtually nonporous body; the improvement comprising utilizing a halide-free, organosilicon-R compound in vapor form having the follow- ing properties: (1) a Si-R bond dissociation energy that is no higher than the dissociation energy of the Si-O bond; (2) a boiling point no higher than 350°C; and (3) which, upon pyrolysis and/or hydrolysis, will produce decomposition products beside SiO2 which are deemed to be environmentally safe or the emissions are below acceptable governmental standards.

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