Method of producing devices using nonplanar lithography

Details Method of producing devices using nonplanar lithography Method of producing devices using nonplanar lithography

G - Physics

03

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G03F 5/24 (2006.01) G03F 7/004 (2006.01) G03F 7/16 (2006.01) G03F 7/18 (2006.01) G03F 7/20 (2006.01) G03F 7/26 (2006.01)

Patent

CA 1291894

- 24 - METHOD OF PRODUCING DEVICES USING NONPLANAR LITHOGRAPHY Abstract A new method for fabricating a device lithographically patterning nonplanar substrates is disclosed. In accordance with this method, a nonplanar substrate surface is patterned by initially substantially conformably coating the surface with a resist. Conformality is achieved by depositing the resist either from the vapor phase or from a mist. In addition, the motions of the constituents of the vapor or mist should be sufficiently random so that the angular flux distribution at any point on the nonplanar substrate surface to be coated is substantially identical to that at any other point to be coated.

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