Method of using selected photoactive compounds in high...

Details Method of using selected photoactive compounds in high... Method of using selected photoactive compounds in high...

G - Physics

03

C

96/174

G03C 1/73 (2006.01) G03F 7/038 (2006.01)

Patent

CA 2017338

-i- PATENT APPLICATION OF Wayne Edmund Feely for METHOD OF USING SELECTED PHOTOACTIVE COMPOUNDS IN HIGH RESOLUTION, ACID HARDENING PHOTORESISTS WITH NEAR ULTRAVIOLET RADIATION DN87-07 BWS/skm ABSTRACT OF DISCLOSURE A method is provided for using selected photoactive compounds in acid hardening photoresists to produce thermally stable, high resolution images with near ultraviolet exposing radiation. These photoactive compounds can be used as photosensitizers for halogen-containing photoacid generators which by themselves do not otherwisegenerate sufficient acid upon exposure to near ultraviolet radiation to catalyze the crosslinking of acid hardening resins. The photoactive compounds are selected from the group consisting of phenothiazine, derivatives of phenothiazine, and phenoxazine. EXPRESS MAIL LABEL NO. B13944782

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