Microelectronic cleaning and arc remover compositions

Details Microelectronic cleaning and arc remover compositions Microelectronic cleaning and arc remover compositions

G - Physics

03

F

G03F 7/42 (2006.01)

Patent

CA 2488737

Cleaning compositions suitable for cleaning microelectronic structures having silicon dioxide, low-k or high-k dielectrics and copper or aluminum metallizations contain a polar organic solvent selected from amides, sulfones, sulfolenes, selenones and saturated alcohols and a strong alkaline base.

L'invention concerne des compositions de nettoyage appropriées pour le nettoyage de structures micro-électroniques possédant du dioxyde de silicium, des diélectriques à k faible et à k élevé et des métallisations de cuivre ou d'aluminium, lesdites compositions renfermant un solvant organique polaire sélectionné parmi les amides, les sulfones, les sulfolènes, les sélénones et les alcools saturés et une base alcaline forte.

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