G - Physics – 03 – F
Patent
G - Physics
03
F
G03F 7/42 (2006.01)
Patent
CA 2488735
Cleaning compositions suitable for cleaning microelectronic structures having silicon dioxide, low-k or high-k dielectrics and copper or aluminum metallizations contain an oxidizing agent and a polar organic solvent selected from amides, sulfones, sulfolenes, selenones and saturated alcohols, and optionally other components.
L'invention concerne des compositions de nettoyage appropriées pour nettoyer des structures micro-électroniques possédant du dioxyde de silicium, des diélectriques à k faible ou à k élevé et des métallisations de cuivre ou d'aluminium, lesdites compositions renfermant un agent d'oxydation et un solvant organique polaire sélectionné parmi des amides, des sulfones, des sulfolènes, des sélénones et des alcools saturés, et facultativement d'autres composés.
Avantor Performance Materials Inc.
Mallinckrodt Baker Inc.
Osler Hoskin & Harcourt Llp
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